Olympus UPLANFL 40x Objective pln10x WORKING DISTANCE: 200 MM

WORKING DISTANCE: 200 MM

while the fine focus delivers precise

and accurate documentation of surface features across the entire viewing area

• Publication-quality image capture for research

Semiconductor wafer and die inspection requiring highest NA reflected light

Olympus UPLANFL 40x Objective pln10x WORKING DISTANCE: 200 MMOLYMPUS UPLANFL 40X UNIVERSAL PLAN FLUORITE OBJECTIVE Achieve high quality imaging with excellent flat field correction and fluorescence performance, featuring: 40x magnification with 0. 75 numerical aperture for high resolution imaging 0. 51mm working distance for standard preparations Universal Plan Fluorite design combining flat field correction with fluorescence optimization RMS thread mount for universal compatibility with CX, BX, and IX series